THE PHOTOGRAPHY MASTER RETREAT, a unique one-week professional retreat in the south of France featuring four renowned mentors, will be returning for its 2016 edition next July 9-16, 2016. The week after Les Rencontres d’Arles.
The retreat is designed for professional or aspiring pro professional photographers in any genre – fine art, conceptual, or documentary – who are passionate about their existing work and committed about taking it to the next level. Four internationally acclaimed mentors will guide, advise and inspire 14 participants. Mentors include former New Yorker visuals editor and curator Elisabeth Biondi; artist-educators Katharina Bosse and Martine Fougeron: and Lyle Rexer, a critic, curator and educator.
Not a shooting trip but a rare chance to pause and reflect, it is a career-enhancing opportunity for professional critique and artistic introspection and bonding during a memorable one-week immersive and communal experience in this remotely beautiful hamlet conducive to contemplation as well as conversation, one-on-one and group discussion, and career-altering inspiration.
The participants are chosen from submitted Applications. As of April 10, only two openings are left for the 2016 Retreat. Applications will be reviewed on a first come, first served basis.
NEWS: Exclusive interviews with Mentors in Lens Culture about The Photography Master Retreat: Creative Flourishing: A Photography Master Retreat
